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Dual Gate Oxide Transistors for Downscaling CMOS Image Sensors


Stanford Reference:

00-046


Abstract


Decreasing the size of CMOS image sensors lowers the cost of manufacturing and raises the spatial resolution of the images. However, the downscaling of CMOS circuits dramatically increases the leakage current and decreases dynamic range. This invention provides a design for a CMOS image sensor that reduces these undesirable effects by combining the use of both thin and thick gate oxide transistors. The thin oxide transistors achieve small area and low power consumption, while the thick oxide transistors ensure low leakage and high voltage swing. This method can be used in the design of active and digital pixel sensors and general analog circuits.

Applications


  • Semi-conductor IC design
  • Active pixel sensor and digital pixel sensor design
  • Analog circuit design

Advantages


  • Low leakage current
  • High voltage swing
  • Small size
  • Low power consumption

Publications


  • H. Tian, X. Liu, S. Lim, S. Kleinfelder, A. El Gamal, "Active pixel sensors fabricated in a standard 0.18um CMOS technology," Proceedings of SPIE, January 2001.

Innovators & Portfolio



Patent Status



Date Released

 4/4/2003 12:00
 

Licensing Contact


Mona Wan, Senior Licensing Manager for Special Projects
650-498-0902 (Business)
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Related Keywords


PS: semiconductor   imaging