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Dual Gate Oxide Transistors for Downscaling CMOS Image Sensors
Stanford Reference:
00-046
Abstract
Decreasing the size of CMOS image sensors lowers the cost of manufacturing and raises the spatial resolution of the images. However, the downscaling of CMOS circuits dramatically increases the leakage current and decreases dynamic range. This invention provides a design for a CMOS image sensor that reduces these undesirable effects by combining the use of both thin and thick gate oxide transistors. The thin oxide transistors achieve small area and low power consumption, while the thick oxide transistors ensure low leakage and high voltage swing. This method can be used in the design of active and digital pixel sensors and general analog circuits.
Applications
Semi-conductor IC design
Active pixel sensor and digital pixel sensor design
Analog circuit design
Advantages
Low leakage current
High voltage swing
Small size
Low power consumption
Publications
H. Tian, X. Liu, S. Lim, S. Kleinfelder, A. El Gamal, "Active pixel sensors fabricated in a standard 0.18um CMOS technology," Proceedings of SPIE, January 2001.
Innovators & Portfolio
Abbas El-Gamal
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SukHwan Lim
Xinqiao (Chiao) Liu
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Patent Status
Issued : 6,642,543 (USA)
Date Released
4/4/2003 12:00
Licensing Contact
Mona Wan, Senior Licensing Manager for Special Projects
650-498-0902 (Business)
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Related Keywords
PS: semiconductor
imaging