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NanoGap


Stanford Reference:

01-227


Abstract


A method of fabricating a variable capacitive device for micromachined sensors and actuators. A critical optimization of these capacitors for both sensing and actuation is achieved by maximizing the capacitance change with gap width or overlap area. This process can be used to build simple facing capacitors, integrated capacitors, and the differential inter-digitated capacitors.

Applications


  • MEMS
  • Sensors
  • Actuators
  • Capacitors

Advantages


  • Significantly finer gap width is achieved through this method compared to common etched process.

Innovators & Portfolio



Patent Status



Date Released

 12/2/2004 12:00
 

Licensing Contact


Mona Wan, Senior Licensing Manager for Special Projects
650-498-0902 (Business)
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Related Keywords


MEMS: bioMEMS   sensors   capacitor   MEMS: MEMS